WAFEB Piranha/HF Sink

WAFAB Piranha/HF Sink

Contains a Piranha cleaning solution to remove organic materials from silicon wafers and a temperature controlled cascading Hydrofluoric Acid (HF) bath for etching oxide layers from silicon wafers. It has a dump rinser, DI water (de-ionized water) sink and teflon guns for the N2 and DI water.